Infinitesima presented a joint paper with IMEC on SPM tomographic sensing at IPFA 2021 on September 14th

 IPFA 2021

Infinitesima featured in a recent article on the growing need for AFM metrology in semiconductor manufacturing.

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Infinitesima will be presenting a joint paper with IMEC on EUV mask metrology on Wednesday, June 9.

Check out the 2021 EUVL Workshop Agenda & Abstract Book

EUVL Workshop 

Read the recent article in Semiconductor Engineering about Next Generation AFM

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