Infinitesima will present a joint paper with IMEC on SPM tomographic sensing at IPFA 2021 in September

 IPFA 2021

Infinitesima featured in a recent article on the growing need for AFM metrology in semiconductor manufacturing.

semi engineering

Infinitesima will be presenting a joint paper with IMEC on EUV mask metrology on Wednesday, June 9.

Check out the 2021 EUVL Workshop Agenda & Abstract Book

EUVL Workshop 

Read the recent article in Semiconductor Engineering about Next Generation AFM

semi engineering