Infinitesima will be attending SEMICON Korea 2024
COEX, Seoul booth A204
Jan 31 - 2 February 2024
Infinitesima is pleased to announce the completion of its investment round to expand production of the Metron®3D 300 mm in-line wafer metrology system.
Infinitesima are proud to be awarded Great Place to Work certification
Thank you to our colleagues for making this happen
Infinitesima will be attending SPIE Advanced Lithography and Patterning
San Jose, California, United States
26 February - 2 March 2023
Infinitesima will be attending SEMICON Korea 2023
COEX, Seoul booth A210
1-3 February 2023
From Lab to Fab, Infinitesima to commercialise powerful new methods for semiconductor device characterisation.
Infinitesima secures strategic investment to ramp production of Metron3D
Infinitesima will be participating at SEMICON Korea between 9-11 February 2022
Infinitesima is proud to announce the launch of Metron3D, the company's first standalone metrology platform aimed at in-line process control applications for the semiconductor industry.
Infinitesima was proud to be selected as one of the Top 40 technology start-up companies in Europe to participate at HTVD21 in Dresden.
Infinitesima are excited to be attending the first NMI Meet & Greet event on 24th November
Infinitesima featured in a recent article on the growing need for AFM metrology in semiconductor manufacturing.
Infinitesima will be presenting a joint paper with IMEC on EUV mask metrology on Wednesday, June 9.
Check out the 2021 EUVL Workshop Agenda & Abstract Book
Read the recent article in Semiconductor Engineering about Next Generation AFM
Infinitesima announces the shipment of RPM-3D to imec for the joint development of 3D tomographic metrology.
Infinitesima will participate in the digital SEMI Technology Unites Global Summit Executive Forum, February 15th - 19th.
Please visit our virtual booth at www.technologyunites.org/about
Infinitesima participated in SPIE Advanced Lithography Conference between 21st - 25th February 2021, and was involved in several research papers.
www.spie.org/conferences-and-exhibitions/advanced-lithography