Participated in the Semi Technology Unit Global Summit Executive Forum
Joint development program signed with IMEC.
Joint presentaion with IMEC at SPIE Advanced Lithography conference
The application of a Rapid Probe Microscope RPM) for investigating 1D and 2D structures for EUV lithography. Andrew D. L. Humphris; Alain Moussa; Mirea Dusa; Anne-Laure Charley; Elis Newham; Jenny Goulden; Lei Feng; Christopher Bevis
A novel high throughput probe microscope: for measuring 3D structures, designed for in-line, integrated or standalone operation. A. D. L. Humphris, L. Fen, M. Tedaldi, L. Mudarikwa, D. Ockwell, J. Goulden
Production version of RPM Generation 6 shipped to Japanese partner for qualification.
Customer accptance of first hybrid wafer RPM-SEM system.
Infinitesima announces Peter Jenkins as President and Chief Executive Officer. Glyn Davies continues as Non-Executive Director.
RPM Generation 6 shipped with Japanese partner integrated in state-of-the-art defect review SEM to leading logic manufacturing in the USA for hybrid wafer metrology.
Infinitesima rellocates to new facility in Abingdon.
Joint presentation with SEMATECH at SPIE Advanced Lithography Conference
Probe Microscopy for Metrology of Next Generation Devices. Andrew D. L, Humphris, Bin Zhao, David Bastard, Benjamin Bunday
Hybrid Adaptive Mode introduced for high aspect ratio structures.
Infinitesima Ltd announces major RPM design win with Zeiss.