The RPM is integrated on to the Zeiss MeRiT® neXT photomask repair tool, where it is used in the workflow for validating mask repair. The RPM is an ideal solution for this application due to the capability to image high aspect ratio structures combined with very high imaging speeds. The RPM provides crucial data when devising a repair strategy and is used to quickly verify results, minimising the need for multiple repair steps. This simplifies the process and delivers maximum efficiency for the Mask shop.
In addition, specifically for EUV masks, the RPM EUV repair module is available which is able to image defects which are invisible to the SEM, particularly challenging multilayer defects.